Jet-and-flash nano imprint lithography: Fabrication of passive wireless surface acoustic wave sensors

Procedia Engineering

Volumn 25, Issue , 2011, Pages 860-863

  Forsen E ^a   Nilsson, D ^a   Ballandras, S ^b   Mayer, E ^c   Sakharov, S ^d  

^a DANISH TECHNOLOGICAL INSTITUTE   (Denmark)

^b CNRS   (France)

^c UNIVERSITY OF FREIBURG   (Germany)

^d Fomos Materials   (Russian Federation)

Author keywords

Lithography; Nano imprint lithography; Sensors; Surface acousitc wave

Indexed keywords

LANGASITES; LIFT-OFF PROCESS; PHYSICAL PARAMETERS; PIEZOELECTRIC SUBSTRATES; SAW SENSORS; SURFACE ACOUSTIC WAVE SENSORS; WIRELESS SENSING; WIRELESS TEMPERATURE MONITORING;

ACOUSTIC SURFACE WAVE DEVICES; FABRICATION; GALLIUM; GALLIUM ALLOYS; LITHOGRAPHY; NANOIMPRINT LITHOGRAPHY; SENSORS; SILICATES;

TEMPERATURE SENSORS;

EID: 84857172985     PISSN: 18777058     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1016/j.proeng.2011.12.211     Document Type: Conference Paper

References (3)

1. Chou, S.Y.; Krauss, P.R.; Renstrom, P.J. "Imprint Lithography with 25-Nanometer Resolution". Science 272 (5258) (1996).
2. Babak. H, Maximov. I, Montelius. L, "Nanoimprint lithography at the 6 in. wafer scale", J. Vac. Sci. Technol. B 18 (3557). (2000).
3. Colburn. M, Johnson. S, Stewart. M, Damle. S, Bailey. T, Choi. B et. Al., "Step and Flash Imprint Lithography: A new approach to high resolution patterning." Proc. SPIE 3676(I): 379 (1999).