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Volumn 38, Issue 3, 2012, Pages 2529-2535

Fabrication and plasma resistance properties of transparent YAG ceramics

Author keywords

C. Optical properties; Microstructure; Plasma resistance; Transparent ceramics; YAG

Indexed keywords

AVERAGE GRAIN SIZE; HIGH QUALITY; PLASMA RESISTANCE; REACTIVE SINTERING; SILICATE GLASS; TRANSPARENT CERAMIC; TRANSPARENT YAG CERAMICS; YAG; YTTRIUM ALUMINUM GARNET;

EID: 84857053729     PISSN: 02728842     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ceramint.2011.11.023     Document Type: Article
Times cited : (32)

References (6)
  • 1
    • 0034272682 scopus 로고    scopus 로고
    • Plasma etching: Principles mechanisms, application to micro- and nano-technologies
    • C. Cardinaud, M.C. Peignon, and P.Y. Tessier Plasma etching: principles mechanisms, application to micro- and nano-technologies Appl. Surf. Sci. 164 2000 72 83
    • (2000) Appl. Surf. Sci. , vol.164 , pp. 72-83
    • Cardinaud, C.1    Peignon, M.C.2    Tessier, P.Y.3
  • 2
    • 33644686577 scopus 로고    scopus 로고
    • Dense yttrium oxide film prepared by aerosol deposition process at room temperature
    • J. Iwasawa, R. Nishimizu, and M. Tokita Dense yttrium oxide film prepared by aerosol deposition process at room temperature J. Ceram. Soc. Jpn. 114 1327 2006 272 276
    • (2006) J. Ceram. Soc. Jpn. , vol.114 , Issue.1327 , pp. 272-276
    • Iwasawa, J.1    Nishimizu, R.2    Tokita, M.3
  • 3
    • 34547681397 scopus 로고    scopus 로고
    • Plasma-resistant dense yttrium oxide film prepared by aerosol deposition process
    • J. Iwasawa, R. Nishimizu, and M. Tokita Plasma-resistant dense yttrium oxide film prepared by aerosol deposition process J. Am. Ceram. Soc. 90 8 2007 2327 2332
    • (2007) J. Am. Ceram. Soc. , vol.90 , Issue.8 , pp. 2327-2332
    • Iwasawa, J.1    Nishimizu, R.2    Tokita, M.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.