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Volumn 30, Issue 1, 2012, Pages

Roughness optimization of electron-beam exposed hydrogen silsesquioxane for immobilization of DNA origami

Author keywords

[No Author keywords available]

Indexed keywords

DNA; OPTIMIZATION; ORGANIC ACIDS; PLASMA APPLICATIONS; SURFACE ROUGHNESS; TWO DIMENSIONAL;

EID: 84856600294     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3676054     Document Type: Article
Times cited : (4)

References (9)
  • 1
  • 2
    • 70149125365 scopus 로고    scopus 로고
    • 10.1038/nnano.2009.220
    • R. J. Kershner, Nat. Nanotechnol. 4, 557 (2009). 10.1038/nnano.2009.220
    • (2009) Nat. Nanotechnol. , vol.4 , pp. 557
    • Kershner, R.J.1
  • 9
    • 33750580903 scopus 로고    scopus 로고
    • Transformation of hydrogen silsesquioxane properties with RIE plasma treatment for advanced multiple-gate MOSFETs
    • DOI 10.1016/j.apsusc.2006.06.021, PII S0169433206008531
    • J. Penaud, F. Fruleux and E. Dubois, Appl. Surf. Sci. 253, 395 (2006). 10.1016/j.apsusc.2006.06.021 (Pubitemid 44679794)
    • (2006) Applied Surface Science , vol.253 , Issue.1 SPEC. ISS. , pp. 395-399
    • Penaud, J.1    Fruleux, F.2    Dubois, E.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.