High resolution e-beam lithography using a thin titanium layer to promote resist adhesion

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 1128-1131

  Macintyre, D S ^a   Young, I ^b   Glidle, A ^a   Cao, X ^a   Weaver, J M R ^a   Thoms, S ^a  

^a UNIVERSITY OF GLASGOW   (United Kingdom)

^b Leica Microsystems Lithography Ltd   (United Kingdom)

Author keywords

Lithography; Resist adhesi

Indexed keywords

ADHESION; NANOSTRUCTURED MATERIALS; OPTICAL RESOLVING POWER; TITANIUM; X RAY PHOTOELECTRON SPECTROSCOPY;

RESIST ADHESION; SUBSTRATE-RESIST INTERACTIONS; TITANIUM LAYER;

ELECTRON BEAM LITHOGRAPHY;

EID: 33646037991     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.103     Document Type: Article

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