Self-assembly growth and electron work function of copper phthalocyanine films on indium tin oxide glass

Applied Surface Science

Volumn 258, Issue 8, 2012, Pages 3373-3377

  Xue, Mingshan ^a,b   Jiang, Zhonghao ^b   Li, Wen ^a,b   Bi, Guangli ^b   Ou, Junfei ^a   Wang, Fajun ^a   Li, Changquan ^a  

^a NANCHANG HANGKONG UNIVERSITY   (China)

^b JILIN UNIVERSITY   (China)

Author keywords

Copper phthalocyanine; Electronic structures; Work function

Indexed keywords

COPPER; ELECTRONIC PROPERTIES; ELECTRONIC STRUCTURE; ENERGY RESOURCES; INDIUM COMPOUNDS; ITO GLASS; SELF ASSEMBLY; SEMICONDUCTING INDIUM; SEMICONDUCTOR MATERIALS; TIN OXIDES; WORK FUNCTION;

COPPER PHTHALOCYANINE; COPPER PHTHALOCYANINE FILMS; ELECTRON WORK FUNCTIONS; SELF-ASSEMBLY GROWTH; STRUCTURAL AND ELECTRONIC PROPERTIES;

FIELD EFFECT TRANSISTORS;

EID: 84856215373     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.10.143     Document Type: Article

References (29)

1. P.C. Kao, S.Y. Chu, S.J. Liu, Z.X. You, and C.A. Chuang J. Electrochem. Soc. 153 2006 H122
2. G. Pham, T.U. Kamben, I. Thurzo, M. Friedrich, and D.R.T. Zahn Appl. Surf. Sci. 212-213 2003 542
3. S. Rajaputra, G. Sagi, and V.P. Singh Sol. Energy Mater. Sol. Cells 93 2009 60
4. J. Mao, H. Zhang, Y. Jiang, Y. Pan, M. Gao, W. Xiao, and H.J. Gao J. Am. Chem. Soc. 131 2009 14136
5. M.S. Xue, W. Li, and F.J. Wang Superlattices Microstruct. 48 2010 213
6. S. Hishita, T. Aizawa, S. Otani, S. Suehara, and H. Haneda Superlattices Microstruct. 39 2006 179
7. E.W. Forsythe, M.A. Abkowitz, and Y. Gao J. Phys. Chem. B 104 2000 3948
8. N.K. Shrestha, H. Kohn, M. Imamura, K. Irie, H. Ogihara, and T. Saji Langmuir 26 2010 17024
9. Z.G. Ji, K.W. Wong, P.K. Tse, R.W.M. Kwok, and W.M. Lau Thin Solid Films 402 2002 79
10. T. Kambayashi, H. Ohta, H. Hoshi, M. Hirano, H. Hosono, H. Takezoe, and K. Ishikawa Cryst. Growth Des. 5 2005 143
11. J. Ren, S. Meng, Y.L. Wang, X.C. Ma, Q.K. Xue, and E. Kaxiras J. Chem. Phys. 134 2011 194706
12. M. Szybowicz, W. Bala, K. Fabisiak, K. Paprocki, and M. Drozdowski J. Mater. Sci. 46 2011 6589
13. I. Kroeger, B. Stadtmueller, C. Stadler, J. Ziroff, M. Kochler, A. Stahl, F. Pollinger, T.L. Lee, J. Zegenhagen, F. Reinert, and C. Kumpf New J. Phys. 12 2011 083038
14. N.V. Tkachenko, V. Chukharev, P. Kaplas, A. Tolkki, A. Efimov, K. Haring, J. Viheriala, T. Niemi, and H. Lemmetyinen Appl. Surf. Sci. 256 2010 3900
15. J.S. Kim, J.H. Park, J.H. Lee, J. Jo, D.Y. Kim, and K. Cho Appl. Phys. Lett. 91 2007 112111
16. W. Li, and D.Y. Li Acta Mater. 54 2006 445
17. M.S. Xue, J. Xie, W. Li, C.G. Yang, Y.L. Ai, F.J. Wang, J.F. Ou, and J.P. Yao Physica B 2011
18. W. Li, and D.Y. Li J. Appl. Phys. 99 2006 073502
19. Y. Zhu, L. Qian, M. Xue, Q. Sheng, Q. Zhang, and Y. Liu Appl. Surf. Sci. 257 2011 2625
20. V.E. Henrich, and P.A. Cox In The Surface Science of Metal Oxides 1994 Academic Cambridge
21. M.S. Xue, and Q. Guo J. Chem. Phys. 127 2007 054705
22. W. Jiang, X. Wang, Y. Chang, S. Yu, C. Ma, K. Ye, C. Cheng, and G. Du J. Cryst. Growth 290 2006 544
23. S. Heutz, S.M. Bayliss, R.L. Middleton, G. Rumbles, and T.S. Jones J. Phys. Chem. B 104 2000 7124
24. M. Ouyang, R. Bai, L. Chen, L. Yang, M. Wang, and H. Chen J. Phys. Chem. C 112 2008 11250
25. J.M. Sykes, and M. Doherty Corros. Sci. 50 2008 2773
26. J. Su, M. Xue, N. Ma, Q. Sheng, Q. Zhang, and Y. Liu Sci. China Ser. B 52 2009 911
27. I. Thorzo, G. Pham, T.U. Kamben, and D.R.T. Zahn Thin Solid Films 433 2003 292
28. W. Li, and D.Y. Li J. Chem. Phys. 122 2005 064708
29. H. Xi, Z. Wei, Z. Duan, W. Xu, and D. Zhu J. Phys. Chem. C 112 2008 19934