In situ measurements of simultaneous electronic behavior of Cu and Al induced by mechanical deformation

Journal of Applied Physics

Volumn 99, Issue 7, 2006, Pages

  Li, W ^a,b   Li, D Y ^b  

^a CHANGCHUN UNIVERSITY   (China)

^b UNIVERSITY OF ALBERTA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; COMPRESSIVE STRESS; DEFORMATION; DISLOCATIONS (CRYSTALS); ELECTRONS; INTERFACES (MATERIALS); MECHANICAL TESTING; TENSILE STRESS;

ELECTRON WORK FUNCTION (EWF); ELECTROSTATIC ENERGY; MECHANICAL BEHAVIOR; PLASTIC RANGE;

COPPER;

EID: 33645971037     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2181300     Document Type: Article

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