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Volumn 24, Issue 2, 2012, Pages 346-352

Wavelength-controlled etching of silicon nanocrystals

Author keywords

hydrofluoric acid etching; photoluminescence; polydispersity; silicon nanocrystals

Indexed keywords

CRUCIAL PARAMETERS; EFFECTIVE SIZE; HF CONCENTRATION; HF ETCHING; HYDROFLUORIC ACID ETCHING; NEAR-IR; PHOTOCHEMICAL ETCHING; REACTION MIXTURE; SI NANOSTRUCTURES; SILICON NANOCRYSTALS; SMALL ANGLE X-RAY SCATTERING; SPECTRAL REGION;

EID: 84856148230     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm203085f     Document Type: Article
Times cited : (30)

References (57)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.