An EUV beamsplitter based on conical grazing incidence diffraction

Optics Express

Volumn 20, Issue 2, 2012, Pages 1825-1838

  Braig, C ^a   Fritzsch, L ^b   Kasebier T ^a   Kley, E B ^a   Laubis, C ^c   Liu, Y ^d   Scholze, F ^c   Tunnermann A ^a,e  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

^b LEIBNIZ INSTITUTE OF PHOTONIC TECHNOLOGY   (Germany)

^c PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^d UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^e FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

OPTICS; SILICON COMPOUNDS; SILICON OXIDES; ULTRAVIOLET RADIATION;

CONICAL DIFFRACTION; DESTRUCTIVE INTERFERENCE; EXTREME ULTRAVIOLET RADIATIONS; GRATING DESIGN; GRAZING INCIDENCE; GRAZING INCIDENCE DIFFRACTION; LOW LOSS; MEASURED DATA; RIGOROUS COUPLED WAVE ANALYSIS; SIMULATED RESULTS; TOTAL EXTERNAL REFLECTION;

DIFFRACTION;

SILICON; SILICON DIOXIDE;

ARTICLE; CHEMISTRY; COMPUTER SIMULATION; EQUIPMENT DESIGN; INSTRUMENTATION; LASER; METHODOLOGY; OPTICS; THEORETICAL MODEL;

COMPUTER SIMULATION; EQUIPMENT DESIGN; LASERS; MODELS, THEORETICAL; OPTICS AND PHOTONICS; SILICON; SILICON DIOXIDE;

EID: 84855918740     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.20.001825     Document Type: Article

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