SCOPUS 정보 검색 플랫폼

Volumn 520, Issue 6, 2012, Pages 1799-1803

Lipon thin films grown by plasma-enhanced metalorganic chemical vapor deposition in a N 2-H 2-Ar gas mixture

(2) Meda, Lamartine a Maxie, Eleston E b

a XAVIER UNIVERSITY OF LOUISIANA (United States)

b Excellatron Solid State LLC (United States)

Author keywords

Electrochemical impedance spectroscopy; Glass electrolyte; Lipon; Lithium ion batteries; Metal organic chemical vapor deposition; Plasma enhanced chemical vapor deposition; Thin films

Indexed keywords

ALUMINA SUBSTRATES; AR PLASMAS; CONDUCTIVITY MEASUREMENTS; GLASS ELECTROLYTE; HIGH IMPEDANCE; LIPON; LITHIUM-ION BATTERY; METAL ORGANIC CHEMICAL VAPOR DEPOSITION; OXYNITRIDES; RADIO FREQUENCY MAGNETRON SPUTTERING; TRIETHYL PHOSPHATES; XPS ANALYSIS;

ALUMINA; AMORPHOUS FILMS; ARGON; DEPOSITION; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; IONIC CONDUCTIVITY; LITHIUM; LITHIUM COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NITRIDES; ORGANIC CHEMICALS; ORGANOMETALLICS; PHOSPHORUS; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY; X RAY POWDER DIFFRACTION;

VAPOR DEPOSITION;

EID: 84855917305 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2011.08.091 Document Type: Article

Times cited : (21)

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