Formation of a polymer particle monolayer by continuous self-assembly from a colloidal solution

Journal of Colloid and Interface Science

Volumn 368, Issue 1, 2012, Pages 9-13

  Kim, Soohyun ^a,b   Choi, Hee Dok ^a,c   Kim, Il Doo ^a   Lee, Jong Chan ^b   Rhee, Bum Ku ^c   Lim, Jung Ah ^a   Hong, Jae Min ^a  

^a Korea Institute of Science and Technology   (South Korea)

^b Seoul National University   (South Korea)

^c Sogang University   (South Korea)

Author keywords

Colloidal solution; Polymer particle monolayer; Self assembly of particle

Indexed keywords

CLOSE-PACKED MONOLAYERS; COATING PROCESS; COLLOIDAL SOLUTIONS; CONSTANT VELOCITIES; CONTACT LINES; CONVECTIVE FLOW; HEMISPHERICAL STRUCTURE; IN-SITU; MONODISPERSED PARTICLES; MONOLAYER GROWTH; MONOLAYER PARTICLE ARRAYS; ORDERED STRUCTURES; PARTICLE CONCENTRATIONS; PARTICLE MOVEMENT; PARTICLE TRANSPORT; POLYMER MICROSPHERES; POLYMER PARTICLE MONOLAYER; POLYMER PARTICLES; SELF-ASSEMBLED; SLIDING SPEED; SOLUTION MENISCUS; SOLUTION PROCESS; SURFACE WETTABILITY; TWO PLATES; ZNO FILMS;

FILM PREPARATION; HEAT CONVECTION; PLATES (STRUCTURAL COMPONENTS); POLYMERS; SELF ASSEMBLY; ZINC OXIDE;

MONOLAYERS;

POLYMER; SELF ASSEMBLED MONOLAYER; ZINC OXIDE;

ARTICLE; COLLOID; CONCENTRATION (PARAMETERS); EVAPORATION; FILM; MATERIAL COATING; NANOFABRICATION; PARTICLE SIZE; PRIORITY JOURNAL; VELOCITY; WETTABILITY;

COLLOIDS; POLYMERS; SILICON DIOXIDE; SOLUTIONS; SURFACE PROPERTIES; WATER;

EID: 84855851075     PISSN: 00219797     EISSN: 10957103     Source Type: Journal    
DOI: 10.1016/j.jcis.2011.07.092     Document Type: Article

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