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Volumn 110, Issue 12, 2011, Pages

Synthesis of submicron metastable phase of silicon using femtosecond laser-driven shock wave

(11) Tsujino, Masashi a,b Sano, Tomokazu a,c Sakata, Osami d Ozaki, Norimasa a Kimura, Shigeru e Takeda, Shingo e Okoshi, Masayuki f Inoue, Narumi f Kodama, Ryosuke a Kobayashi, Kojiro F g Hirose, Akio a

a OSAKA UNIVERSITY (Japan)

b JAPAN SOCIETY FOR THE PROMOTION OF SCIENCE (Japan)

c JAPAN SCIENCE AND TECHNOLOGY AGENCY (Japan)

d NATIONAL INSTITUTE FOR MATERIALS SCIENCE (Japan)

e JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE (Japan)

f NATIONAL DEFENSE ACADEMY (Japan)

g WAKASA WAN ENERGY RESEARCH CENTER (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE STRUCTURE; FEMTOSECONDS; GRAIN SIZE; HIGH-PRESSURE PHASIS; LASER-DRIVEN SHOCK WAVES; METASTABLE PHASE; PRESSURE LOADING; SHOCK COMPRESSIONS; SUBMICRON; SUBMICRON GRAINS; SUBMICRON SIZE; X-RAY DIFFRACTION MEASUREMENTS;

CRYSTALLINE MATERIALS; METASTABLE PHASES; SEMICONDUCTOR INSULATOR BOUNDARIES; SHOCK WAVES; ULTRASHORT PULSES; X RAY DIFFRACTION;

SILICON;

EID: 84855318227 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3673591 Document Type: Article

Times cited : (27)

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