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Journal of Physics and Chemistry of Solids

Volumn 73, Issue 3, 2012, Pages 391-395

The porous silicon morphology effect on the growth of electrodeposited FeNi alloy

(8) Ouir, S a,b Fortas, G a Sam, S a Aliouat, H b Manseri, A a Belaroussi, Y c Gabouze, N a Khereddine, A Y c

a L'Unite de Developpement de la Technologie du Silicium (Algeria)

b UNIVERSITY OF BLIDA (Algeria)

c CENTRE DE DÉVELOPPEMENT DES TECHNOLOGIES AVANCÉES (Algeria)

Author keywords

A. Alloys; B. Chemical synthesis; D. Magnetic properties

Indexed keywords

B. CHEMICAL SYNTHESIS; CATHODIC DEPOSITION; CONSTANT POTENTIAL; DEPOSITED FILMS; FENI ALLOYS; FENI FILMS; MACROPOROUS; MESOPOROUS SILICON; POLARIZATION POTENTIAL; POROUS SILICON SURFACES; SEM IMAGE; SILICON MICROSTRUCTURES; SILICON MORPHOLOGY; XRD SPECTRA;

CERIUM ALLOYS; DEPOSITION; ELECTRODEPOSITION; ENERGY DISPERSIVE SPECTROSCOPY; MAGNETIC MATERIALS; MAGNETIC PROPERTIES; MORPHOLOGY; SEMICONDUCTING SILICON COMPOUNDS; SYNTHESIS (CHEMICAL); THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION;

POROUS SILICON;

EID: 84855286357 PISSN: 00223697 EISSN: None Source Type: Journal
DOI: 10.1016/j.jpcs.2011.10.042 Document Type: Article

Times cited : (7)

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