SCOPUS 정보 검색 플랫폼

Vacuum

Volumn 79, Issue 3-4, 2005, Pages 134-139

Effect of annealing temperature on characteristics of Ni 49Fe51 films sputter deposited on SiO2/Si (1 0 0)

(6) Chen, Xiaobai a,b Qiu, Hong a Wu, Ping a Wang, Fengping a Pan, Liqing a Tian, Yue a

a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING (China)

b BEIJING TECHNOLOGY AND BUSINESS UNIVERSITY (China)

Author keywords

Annealing; Magnetization; Ni49Fe51 film; Resistivity; Sputtering; Structure

Indexed keywords

ANNEALING; COERCIVE FORCE; CRYSTAL ORIENTATION; ELECTRIC CONDUCTIVITY; FILM GROWTH; MAGNETIZATION; MAGNETOMETERS; NICKEL COMPOUNDS; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; X RAY DIFFRACTION ANALYSIS;

ANNEALING TEMPERATURE; FIELD EMISSION SCANNING ELECTRON MICROSCOPY (FE-SEM); ISOTROPIC MAGNETIZATION; NI49FE51 FILMS;

THICK FILMS;

EID: 22544465311 PISSN: 0042207X EISSN: None Source Type: Journal
DOI: 10.1016/j.vacuum.2005.02.006 Document Type: Article

Times cited : (3)

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