New experiments on the electrodeposition of iron in porous silicon

Microelectronics Reliability

Volumn 40, Issue 4-5, 2000, Pages 877-879

  Renaux, C ^a   Scheuren, V ^a   Flandre, D ^a  

^a UNIVERSITÉ CATHOLIQUE DE LOUVAIN   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE; ELECTRIC CURRENT MEASUREMENT; ELECTRODEPOSITION; HETEROJUNCTIONS; IRON; NUCLEATION; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR METAL BOUNDARIES; SILICON WAFERS;

CHRONOAMPEROMETRY;

POROUS SILICON;

EID: 0033742643     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0026-2714(99)00331-5     Document Type: Article

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