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Volumn 43, Issue 2-3, 2012, Pages 470-474

Enhancements in specimen preparation of Cu(In,Ga)(S,Se) 2 thin films

Author keywords

3D EBSD; Cu agglomerates; Cu(In,Ga)(S,Se) 2 thin film solar cells; FIB; GD OES; SIMS

Indexed keywords

3D EBSD; CU(IN ,GA)(S ,SE)2; CU(IN,GA)(S,SE) 2 THIN FILM SOLAR CELLS; FIB; GD-OES; HIGH QUALITY; ION-BEAM SPUTTERING; MATERIAL SYSTEMS; REACTIVE GAS; SEM IMAGING; THIN FILM STACKS; THREE-DIMENSIONAL ELECTRONS;

EID: 84855218659     PISSN: 09684328     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.micron.2011.11.004     Document Type: Article
Times cited : (19)

References (16)
  • 2
    • 0000143569 scopus 로고
    • Alloy sputtering
    • Betz G. Alloy sputtering. Surf. Sci. 1980, 92:283-309.
    • (1980) Surf. Sci. , vol.92 , pp. 283-309
    • Betz, G.1
  • 5
    • 84855214874 scopus 로고    scopus 로고
    • Study in analytical glow discharge spectrometry and its application in materials science, Dissertation, TU Dresden, Germany.
    • Efimova, V., 2011. Study in analytical glow discharge spectrometry and its application in materials science, Dissertation, TU Dresden, Germany.
    • (2011)
    • Efimova, V.1
  • 6
    • 0001451429 scopus 로고    scopus 로고
    • Reactive ion beam etching of InSb and InAs with ultrasmooth surfaces
    • Frost F., Schindler A., Bigl F. Reactive ion beam etching of InSb and InAs with ultrasmooth surfaces. Semicond. Sci. Technol. 1998, 13:523-527.
    • (1998) Semicond. Sci. Technol. , vol.13 , pp. 523-527
    • Frost, F.1    Schindler, A.2    Bigl, F.3
  • 13
    • 0030644568 scopus 로고    scopus 로고
    • Reactive Ion etching mechanism of copper film in chlorine-based electron cyclotron resonance plasma
    • Lee S.-K., Chun S.-S., Hwang C., Lee W.-J. Reactive Ion etching mechanism of copper film in chlorine-based electron cyclotron resonance plasma. Jpn. J. Appl. Phys. 1997, 36:50-55.
    • (1997) Jpn. J. Appl. Phys. , vol.36 , pp. 50-55
    • Lee, S.-K.1    Chun, S.-S.2    Hwang, C.3    Lee, W.-J.4
  • 16
    • 18444377038 scopus 로고    scopus 로고
    • An accurate semi-empirical equation for sputtering yields I: for argon ions
    • Seah M.P., Clifford C.A., Green F.M., Gilmore I.S. An accurate semi-empirical equation for sputtering yields I: for argon ions. Surf. Interface Anal. 2005, 37:444-458.
    • (2005) Surf. Interface Anal. , vol.37 , pp. 444-458
    • Seah, M.P.1    Clifford, C.A.2    Green, F.M.3    Gilmore, I.S.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.