Determination of the stress level for voltage screen of integrated circuits

Microelectronics Reliability

Volumn 50, Issue 9-11, 2010, Pages 1210-1214

  Kho, R M ^a   Moonen, A J ^a   Girault, V M ^a   Bisschop, J ^a   Olthof, E H T ^a   Nath, S ^a   Liang, Z N ^a  

^a NXP SEMICONDUCTORS   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

APPLIED VOLTAGES; DEFECTIVITY; GENERAL APPROACH; PROCESS RELIABILITY; RULE OF THUMB; STRESS LEVELS; STRESS VOLTAGES;

EID: 84755161086     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.microrel.2010.07.103     Document Type: Conference Paper

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