The influence of diffusion temperature on the structural, optical, and magnetic properties of nickel-doped zinc oxysulfide thin films

Physica Status Solidi (A) Applications and Materials Science

Volumn 209, Issue 1, 2012, Pages 160-166

  Polat, Ismail ^a   Aksu, Serdar ^b   Altunbaş, Mustafa ^a   Bacaksz, Emin ^a  

^a KARADENIZ TECHNICAL UNIVERSITY   (Turkey)

^b SoloPower Inc   (United States)

Author keywords

annealing; ferromagnetism; Ni doped zinc oxysulfide; semiconductor thin films; XPS

Indexed keywords

ACCELERATING VOLTAGES; ANNEALING TEMPERATURES; ATOMIC CONCENTRATION; DIFFUSION TEMPERATURE; ENERGY DISPERSIVE X RAY SPECTROSCOPY; GLASS SUBSTRATES; NI-DOPED; NI-DOPING; OPTICAL TRANSMISSION MEASUREMENTS; PREFERRED ORIENTATIONS; SEMICONDUCTOR THIN FILMS; SPRAY PYROLYSIS METHOD; UNDOPED FILMS; UNIFORM DISTRIBUTION; WURTZITES; XRD; ZN(O ,S); ZNO;

ANNEALING; ATOMIC SPECTROSCOPY; DIFFUSION; FERROMAGNETISM; LIGHT TRANSMISSION; MAGNETIC FIELDS; MAGNETIC PROPERTIES; SCANNING ELECTRON MICROSCOPY; SPRAY PYROLYSIS; SUBSTRATES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY; X RAY SPECTROSCOPY; ZINC; ZINC OXIDE; ZINC SULFIDE;

SEMICONDUCTOR DOPING;

EID: 84055218366     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.201127248     Document Type: Article

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