Pattern-dependent copper microcorrosion from CMP

Electrochemical and Solid-State Letters

Volumn 7, Issue 10, 2004, Pages

  Chen, K W ^a   Wang, Y L ^b   Chang, L ^a   Chang, S C ^b   Li, F Y ^b   Lin, S H ^c  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NATIONAL CHI NAN UNIVERSITY   (Taiwan)

^c NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; CORROSION; ELECTRIC POTENTIAL; OXIDATION; SEMICONDUCTOR JUNCTIONS; STRESS ANALYSIS;

AUGER ANALYSIS; MICROCORROSION; PHOTOCORROSION; TRENCH ISLANDS;

CHEMICAL MECHANICAL POLISHING;

EID: 8344284294     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1795632     Document Type: Article

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