Suicide formation from laser thermal processing of Ti/Co bilayers

Electrochemical and Solid-State Letters

Volumn 7, Issue 10, 2004, Pages

  Chow, F L ^a   Pey, K L ^a   Lee, P S ^b   Tung, C H ^c   Wang, X C ^d   Lim, G C ^d   Chong, Y F ^e  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^c INSTITUTE OF MICROELECTRONICS   (Singapore)

^d SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

^e CHARTERED SEMICONDUCTOR MANUFACTURING LTD   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING TEMPERATURE; CONSTITUTIONAL SUPERCOOLING (CSC); ELEMENTAL MAPPING; LASER THERMAL PROCESSING;

CRYSTAL DEFECTS; CRYSTALLIZATION; DIFFUSION; LASER PULSES; MICROSTRUCTURE; RAMAN SCATTERING; RAPID THERMAL ANNEALING; SOLIDIFICATION; SUPERCOOLING; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

SILICA;

EID: 8344250967     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1788612     Document Type: Article

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