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Applied Physics Letters

Volumn 81, Issue 20, 2002, Pages 3786-3788

Laser-induced amorphization of silicon during pulsed-laser irradiation of Tin/Ti/polycrystalline silicon/SiO2/silicon

(6) Chong, Y F a Pey, K L a Wee, A T S a Thompson, M O b Tung, C H c See, A d

a NATIONAL UNIVERSITY OF SINGAPORE (Singapore)

b Cornell University (United States)

c INSTITUTE OF MICROELECTRONICS (Singapore)

d CHARTERED SEMICONDUCTOR MANUFACTURING LTD (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHIZATION; CHEMICAL VAPOR DEPOSITION; CRYSTAL MICROSTRUCTURE; LASER BEAM EFFECTS; RAPID THERMAL ANNEALING; SEMICONDUCTING FILMS; SILICA; SILICON WAFERS; SOLIDIFICATION; TITANIUM NITRIDE;

LASER THERMAL PROCESSING (LTP);

POLYSILICON;

EID: 0037065117 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.1521579 Document Type: Article

Times cited : (21)

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