X-ray photoelectron spectroscopy on implanted argon as a tool to follow local structural changes in thin films

Thin Solid Films

Volumn 520, Issue 5, 2011, Pages 1625-1630

  Lahrood, Atena Rastgoo ^a   De Los Arcos, Teresa ^a   Prenzel, Marina ^a   Von Keudell, Achim ^a   Winter, Jörg ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

Rare gas; Thin film structure; X ray photoelectron spectroscopy (XPS)

Indexed keywords

ARGON ION; BINDING ENERGY POSITIONS; CORE LEVELS; CRYSTALLINE STRUCTURE; DEFECT HEALING; DIFFERENT EFFECTS; ELECTRONIC SHELLS; GAS ATOMS; GAS BUBBLE FORMATION; HOST MATRICES; IMPLANTATION ENERGIES; INSULATING SUBSTRATES; LOCAL ENVIRONMENTS; MATRIX; MATRIX MATERIALS; POST ANNEALING TREATMENT; RARE GAS; STRUCTURAL CHANGE; THIN FILM STRUCTURE; X-RAY PHOTOELECTRON SPECTROSCOPY (XPS);

ARGON; ATOMIC SPECTROSCOPY; BINDING ENERGY; BOND STRENGTH (CHEMICAL); ELECTRONS; PHOTONS; SEMICONDUCTING FILMS; THIN FILMS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 82755182811     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.07.040     Document Type: Conference Paper

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