CO addition in low-pressure chemical vapour deposition of medium-temperature TiCxN1-x based hard coatings

Surface and Coatings Technology

Volumn 206, Issue 7, 2011, Pages 1691-1697

  Czettl, C ^a   Mitterer, C ^b   Muhle U ^c   Rafaja, D ^c   Puchner, S ^d,g   Hutter, H ^d   Penoy, M ^e   Michotte, C ^e   Kathrein, M ^f,h  

^a MATERIALS CENTER LEOBEN FORSCHUNG GMBH   (Austria)

^b UNIVERSITY OF LEOBEN   (Austria)

^c TU BERGAKADEMIE FREIBERG   (Germany)

^d VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

^e CERATIZIT Luxembourg S à r l ^*  (Luxembourg)

^f CERATIZIT AUSTRIA GMBH   (Austria)

^g KAI Kompetenzzentrum Automobil u Industrieelektronik GmbH   (Austria)

^h PLANSEE SE   (Austria)

Author keywords

Chemical vapour deposition; CO; Hard coatings; TiCN

Indexed keywords

BASE LAYERS; CEMENTED CARBIDES; CHEMICAL VAPOUR DEPOSITION; CO-FEEDS; COADDITION; COATING THICKNESS; FEED GAS; GRAIN SIZE; MEDIUM TEMPERATURE; MICROSTRUCTURE AND PROPERTIES; OXYGEN CONTENT; RANDOMLY DISTRIBUTED; RESIDUAL TENSILE STRESS; SUBMICRON; TICN; TWIN BOUNDARIES;

COBALT; HARD COATINGS; IMAGE CODING; METAL CUTTING; OXYGEN; SURFACE ROUGHNESS; THICKNESS MEASUREMENT; TITANIUM CARBIDE;

CHEMICAL VAPOR DEPOSITION;

EID: 82755160698     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.07.086     Document Type: Article

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