Microtexture and hardness of CVD deposited α-Al2O3 and TiCxN1-x coatings

International Journal of Refractory Metals and Hard Materials

Volumn 27, Issue 2, 2009, Pages 458-464

  Chien, Harry ^a   Gao, Michael C ^a   Miller, Herbert M ^a   Rohrer, Gregory S ^a   Ban, Zhigang ^b   Prichard, Paul ^b   Liu, Yixiong ^b  

^a CARNEGIE MELLON UNIVERSITY   (United States)

^b KENNAMETAL INC   (United States)

Author keywords

Coatings; Hardness; Microstructure; Texture

Indexed keywords

ALUMINUM; CHEMICAL VAPOR DEPOSITION; COATINGS; ELECTRODEPOSITION; FILMS; GRAIN BOUNDARIES; GROWTH (MATERIALS); HARDNESS; MICROSTRUCTURE; TEMPERATURE INDICATING CAMERAS; TITANIUM CARBIDE;

ALUMINA LAYERS; CHEMICAL VAPOR DEPOSITED; COHERENT TWINS; ELECTRON BACK-SCATTER DIFFRACTIONS; GROWTH DIRECTIONS; MICRO TEXTURES; TEXTURE;

TEXTURES;

EID: 59649099175     PISSN: 02634368     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijrmhm.2008.09.010     Document Type: Article

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