Influence of annealing temperature on field emission from tetrapod-shaped ZnO-whisker films obtained by screen printing

Materials Science in Semiconductor Processing

Volumn 13, Issue 5-6, 2010, Pages 400-404

  Fan, X M ^a   Zhang, H G ^a   Wang, J ^a   Zhou, Z W ^a  

^a SOUTHWEST JIAOTONG UNIVERSITY   (China)

Author keywords

Field emission; Field enhancement factor; Microstructure; X ray diffraction; ZnO whisker

Indexed keywords

ANNEALING TEMPERATURES; DEPOSITED FILMS; EMISSION ENHANCEMENT; FIELD EMISSION PROPERTY; FIELD ENHANCEMENT FACTOR; HIGH FIELD; INDIUM-TIN-OXIDE GLASS SUBSTRATES; LIGHT SPOT; LOW EMISSION; SCANNING ELECTRONIC MICROSCOPY; SCREEN PRINTING METHODS; THRESHOLD FIELDS; TURN-ON FIELD; ZNO WHISKER;

ANNEALING; FIELD EMISSION; INDIUM; INDIUM COMPOUNDS; ITO GLASS; MICROSTRUCTURE; SCREEN PRINTING; SUBSTRATES; SURFACE STRUCTURE; TIN; TIN OXIDES; X RAY DIFFRACTION; ZINC OXIDE;

OXIDE FILMS;

EID: 82455167878     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mssp.2011.05.012     Document Type: Article

References (20)

1. L.Y. Kui, Z.C. Chun, and L.X. Hui Diamond Relat Mater 11 2002 1845
2. Z.W. Pan, F.C.K. Au, H.L. Lai, W.Y. Zhou, L.F. Sun, and Z.O. Liu J Phys Chem B 105 2001 1519
3. J. Singh, S.S. Patil, M.A. More, D.S. Joag, R.S. Tiwari, and O.N. Srivastava Appl Surf Sci 256 2010 6157
4. H. Jin, Y.L. Li, J.J. Li, and C.Z. Gu Microelectron Eng 86 2009 1159
5. L. Nilsson, O. Groening, C. Emmenegger, O. Kuettel, E. Schaller, and L. Schlapbach Appl Phys Lett 76 2000 2071
6. R.C. Smith, R.D. Forrest, J.D. Carey, W.K. Hsu, and S.R.P. Silva Appl Phys Lett 87 2005 013111
7. Y.H. Yang, B. Wang, N.S. Xu, and G.W. Yang Appl Phys Lett 89 2006 043108
8. J.P. Liu, C.X. Xu, G.P. Zhu, X. Li, Y.P. Cui, and Y. Yang J Phys D: Appl Phys 40 2007 1906
9. C.J. Lee, T.J. Lee, S.C. Lyu, Y. Zhang, H. Ruh, and H.J. Lee Appl Phys Lett 81 2002 3648
10. S.H. Jo, D. Banerjee, and Z.F. Ren Appl Phys Lett 85 2004 1407
11. K.B. Zheng, H.T. Shen, J.L. Li, D.L. Sun, G.R. Chen, and K. Hou Vacuum 83 2009 261
12. J.T. Li, W. Lei, X.B. Zhang, X.D. Zhou, Q.L. Wang, and Y.N. Zhang Appl Surf Sci 220 2003 96
13. Z.W. Zhou, W.M. Peng, S.Y. Ke, and H. Deng J Mater Process Technol 8990 1999 415
14. R.H. Fowler, and L.W. Nordheim Proc R Soc Lond, Ser A 119 1928 173
15. T. Sugino, C. Kimura, and T. Yamamoto Appl Phys Lett 80 2002 3602
16. S. Altman, P.V. Pikhitsa, and M. Choi Appl Phys Lett 84 2004 1126
17. Richard G. Forbes Ultramicroscopy 79 1999 11
18. Y.H. Yang, B. Wang, N.S. Xu, and G.W. Yang Appl Phys Lett 89 2006 043108
19. K. Hou, C. Li, W. Lei, X.b. Zhang, X.X. Yang, and K.Q.B.P. Wang Physica E 41 2009 470
20. Z.S. Zhang, J.Y. Huang, H.P. He, S.H. Lin, H.P. Tang, and H.M. Lu Solid-State Electron 53 2009 578