Comparison between RF and DC magnetron reactive sputtered molybdenum oxide thin films for gas sensors

Optoelectronics and Advanced Materials, Rapid Communications

Volumn 4, Issue 10, 2010, Pages 1485-1488

  Boyadzhiev, S ^a,b   Lazarova, V ^b   Rassovska, M ^a   Yordanova, I ^a   Yordanov, R ^a  

^a TECHNICAL UNIVERSITY OF SOFIA   (Bulgaria)

^b BULGARIAN ACADEMY OF SCIENCES   (Bulgaria)

Author keywords

Gas sensor; Molybdenum oxide; Quartz crystal microbalance; Reactive sputtering; Thin films

Indexed keywords

AMMONIA; CHEMICAL SENSORS; CRYSTALS; DEPOSITION RATES; GAS DETECTORS; MAGNETRONS; MOLYBDENUM OXIDE; OXIDE FILMS; QUARTZ; QUARTZ CRYSTAL MICROBALANCES; REACTIVE SPUTTERING; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

AS-DEPOSITED STATE; DIRECT-CURRENT MAGNETRONS; ENVIRONMENT MONITORING; HIGH-RESOLUTION SCANNING ELECTRON MICROSCOPIES; LASER ELLIPSOMETRY; QUARTZ RESONATORS; RADIO FREQUENCIES; THICKNESS OF THE FILM;

FILM PREPARATION;

EID: 81855167802     PISSN: 18426573     EISSN: 20653824     Source Type: Journal    
DOI: None     Document Type: Article

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