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Volumn 662, Issue 1, 2012, Pages 61-70

Area detector corrections for high quality synchrotron X-ray structure factor measurements

Author keywords

Amorphous; Area detector; Corrections; X ray diffraction

Indexed keywords

AMORPHOUS MATERIALS; AMORPHOUS SILICON; GERMANIUM COMPOUNDS; GLASS; METALLIC GLASS; PIXELS; SELENIUM COMPOUNDS; SILICON DETECTORS; SYSTEMATIC ERRORS; X RAY DIFFRACTION;

EID: 81855161820     PISSN: 01689002     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nima.2011.09.031     Document Type: Article
Times cited : (103)

References (28)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.