Fabrication and characterization of erbium-doped fluoropolymer patterns via UV-nanoimprint lithography for use in planar optical amplifiers

Molecular Crystals and Liquid Crystals

Volumn 551, Issue , 2011, Pages 318-327

  Kim, Wook Hyun ^a   Choi, Myung Seok ^b   Han, Yoon Soo ^c  

^a Daegu Gyeongbuk Institute of Science and Technology   (South Korea)

^b Konkuk University   (South Korea)

^c Catholic University of Daegu   (South Korea)

Author keywords

Erbium; Fluoropolymer; Planar optical amplifiers; UV nanoimprint lithography

Indexed keywords

CROSS LINKING AGENTS; CROSSLINKED; ER-DOPED; ERBIUM DOPED; FLUOROPOLYMER; FLUOROPOLYMER FILMS; GLASS SUBSTRATES; HEXANEDIOL DIACRYLATE; HIGH THERMAL; HOST MATERIALS; PHOTO-INITIATOR; PLANAR OPTICAL AMPLIFIERS; PRECURSOR SOLUTIONS; TRIFLUOROMETHANE; UV NANOIMPRINT LITHOGRAPHY; VISIBLE AND NEAR INFRARED; WEIGHT RATIOS;

CROSSLINKING; ERBIUM; FLUORINE CONTAINING POLYMERS; LIGHT AMPLIFIERS; OPTICAL SWITCHES; OPTICAL WAVEGUIDES; PYROLYSIS; SUBSTRATES;

NANOIMPRINT LITHOGRAPHY;

EID: 81255205367     PISSN: 15421406     EISSN: 15635287     Source Type: Journal    
DOI: 10.1080/15421406.2011.601201     Document Type: Article

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