Determination of trace elements in high-purity copper by ETV-ICP OES using halocarbons as chemical modifiers

Journal of Analytical Atomic Spectrometry

Volumn 26, Issue 12, 2011, Pages 2404-2418

  Hassler, Jürgen ^a   Barth, Peter ^a   Richter, Silke ^b   Matschat, Ralf ^b  

^a ESK Ceramics GmbH & Co KG   (Germany)

^b BAM FEDERAL INSTITUTE FOR MATERIALS RESEARCH AND TESTING   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANALYTES; ANALYTICAL RESULTS; CALIBRATION SOLUTIONS; CERTIFIED REFERENCE MATERIALS; CHEMICAL MODIFIERS; COPPER MATERIALS; COST EFFECTIVE; ELECTROTHERMAL VAPORIZATION; ENHANCED SENSITIVITY; HIGH-PURITY; IN-SITU; INDUCTIVELY COUPLED PLASMA-OPTICAL EMISSION SPECTROMETRY; LIMITS OF QUANTIFICATION; MATRIX; MATRIX SEPARATION; MOLTEN COPPER; MULTI-ELEMENT SOLUTIONS; SAMPLE PREPARATION; SOLID SAMPLING; TRANSPORT EFFICIENCY;

ANTIMONY; BISMUTH; CALIBRATION; CHARACTERIZATION; CHROMIUM; COPPER; FLUORINE; HALOCARBONS; INDUCTIVELY COUPLED PLASMA; MANGANESE; OPTICAL EMISSION SPECTROSCOPY; PLASMA DIAGNOSTICS; SILVER; TABLE LOOKUP; TIN; TRACE ELEMENTS; ZINC; ZIRCONIUM;

TRACE ANALYSIS;

EID: 81255143826     PISSN: 02679477     EISSN: 13645544     Source Type: Journal    
DOI: 10.1039/c1ja10149h     Document Type: Article

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