Preparation and characterization of transparent conductive zinc doped tin oxide thin films prepared by radio-frequency magnetron sputtering

Journal Wuhan University of Technology, Materials Science Edition

Volumn 26, Issue 3, 2011, Pages 388-392

  Zhao, Jiang ^a   Ni, Jiamiao ^a   Zhao, Xiujian ^a   Xiong, Yuli ^a  

^a WUHAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Radio frequency (RF) magnetron sputtering; Substrate temperature; Transparent conducting fi lm; Zinc doped tin oxide (ZTO)

Indexed keywords

ATOMIC FORCE MICROSCOPES; CERAMIC TARGET; ELECTRICAL CHARACTERISTIC; OPTICAL PERFORMANCE; PREFERRED ORIENTATIONS; QUARTZ SUBSTRATE; RADIO FREQUENCY MAGNETRON SPUTTERING; SUBSTRATE TEMPERATURE; TETRAGONAL RUTILE STRUCTURE; TIN OXIDE THIN FILM; TRANSPARENT CONDUCTING FI LM; TRANSPARENT CONDUCTIVE; VISIBLE REGION; ZNO;

ATOMIC FORCE MICROSCOPY; CARRIER CONCENTRATION; CARRIER MOBILITY; CONDUCTIVE FILMS; HALL MOBILITY; MAGNETRON SPUTTERING; OPTICAL FILMS; OXIDE FILMS; QUARTZ; SUBSTRATES; THIN FILMS; TIN; TIN OXIDES; TINNING; X RAY DIFFRACTION; ZINC; ZINC OXIDE;

FILM PREPARATION;

EID: 81255129620     PISSN: 10002413     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11595-011-0235-z     Document Type: Article

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