Effect of deposition conditions on the characteristics of ZnO-SnO2 thin films deposited by filtered vacuum arc

Thin Solid Films

Volumn 515, Issue 3, 2006, Pages 880-884

  Cetinorgu E ^a,b   Goldsmith, S ^a   Boxman, R L ^a  

^a TEL AVIV UNIVERSITY   (Israel)

^b CUKUROVA UNIVERSITY   (Turkey)

Author keywords

Dispersion energy; FVAD; Optical properties

Indexed keywords

ABSORPTION; DEPOSITION; TIN COMPOUNDS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

ABSORPTION COEFFICIENT; DISPERSION ENERGY; FVAD; GLASS SUBSTRATES;

THIN FILMS;

EID: 33750482266     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.07.050     Document Type: Article

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