Topography and field effects in secondary ion mass spectrometry - Part I: Conducting samples

Journal of the American Society for Mass Spectrometry

Volumn 22, Issue 10, 2011, Pages 1718-1728

  Lee, Joanna L S ^a   Gilmore, Ian S ^a   Seah, Martin P ^a   Fletcher, Ian W ^b  

^a NATIONAL PHYSICAL LABORATORY   (United Kingdom)

^b Intertek MSG   (United Kingdom)

Author keywords

Delayed extraction; Extraction field; Extraction voltage; Field effects; Imaging; Ion scattering; Static SIMS; Topography

Indexed keywords

DELAYED EXTRACTION; EXTRACTION FIELD; EXTRACTION VOLTAGE; FIELD EFFECTS; ION SCATTERING; STATIC SIMS;

CHEMICAL ANALYSIS; COMPUTER SIMULATION; IODINE; ION BEAM LITHOGRAPHY; SECONDARY EMISSION; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SPECTROMETRY; TOPOGRAPHY; WIRE;

IONS;

GOLD NANOPARTICLE; POLYETHYLENE TEREPHTHALATE; SILICON;

ANALYTICAL PARAMETERS; ARTICLE; ARTIFACT; CHEMICAL ANALYSIS; CHEMICAL REACTION; COMPUTER MODEL; COMPUTER SIMULATION; CONTROLLED STUDY; ELECTRIC CONDUCTIVITY; ELECTRIC FIELD; ELECTRIC POTENTIAL; EXPERIMENTAL DESIGN; IMAGE ANALYSIS; MASS SPECTROMETRY; PRINCIPAL COMPONENT ANALYSIS; PROCESS MODEL; PROCESS OPTIMIZATION; SURFACE CHARGE; TIME OF FLIGHT MASS SPECTROMETRY; TOPOGRAPHY;

GOLD; MODELS, MOLECULAR; REPRODUCIBILITY OF RESULTS; SPECTROMETRY, MASS, SECONDARY ION; SURFACE PROPERTIES;

EID: 80755189410     PISSN: 10440305     EISSN: 18791123     Source Type: Journal    
DOI: 10.1007/s13361-011-0201-1     Document Type: Article

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