SCOPUS 정보 검색 플랫폼

Volumn 520, Issue 2, 2011, Pages 747-751

Er3+ related 1.53 μm emission from Er-Si-codoped ZnO multilayer film prepared by rf-sputtering

(9) Wang, Xiao a Xu, Fei b Jiang, Zuimin a Zheng, Lingling b Ma, Zhongquan b Xu, Run b Yu, Bin b Li, Mingzhu a Lu, Fang a

a FUDAN UNIVERSITY (China)

b SHANGHAI UNIVERSITY (China)

Author keywords

Energy transfer; Erbium doping; Silicon nanocrystals; ZnO thin film

Indexed keywords

ANNEALING CONDITION; CO-DOPED ZNO; COSPUTTERING; ER CONCENTRATIONS; ER-DOPED; ERBIUM DOPING; MAXIMUM INTENSITIES; MONOLAYER FILM; NEAR-INFRARED EMISSIONS; NONMONOTONIC TEMPERATURE DEPENDENCE; PL INTENSITY; RF-SPUTTERING; SILICON NANOCRYSTALS; ZNO; ZNO THIN FILM;

ENERGY TRANSFER; ERBIUM; FILM PREPARATION; METALLIC FILMS; MONOLAYERS; MULTILAYER FILMS; MULTILAYERS; NANOCRYSTALS; SEMICONDUCTING SILICON COMPOUNDS; SILICON; ZINC OXIDE;

SEMICONDUCTOR DOPING;

EID: 80755163195 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2011.01.349 Document Type: Conference Paper

Times cited : (6)

References (22)

1
- 0033356093
- D.T.X. Thao, T. Gregorkiewicz, and J.M. Langer Phys. B 273-274 1999 338
- (1999) Phys. B , vol.273-274 , pp. 338
- Thao, D.T.X.¹ Gregorkiewicz, T.² Langer, J.M.³

2
- 36649013683
- P. Noé, B. Salem, E. Delamadeleine, D. Jalabert, V. Calvo, C. Maurizio, and F. D'Acapito J. Appl. Phys. 102 2007 103516
- (2007) J. Appl. Phys. , vol.102 , pp. 103516
- Noé, P.¹ Salem, B.² Delamadeleine, E.³ Jalabert, D.⁴ Calvo, V.⁵ Maurizio, C.⁶ D'Acapito, F.⁷

3
- 0001308266
- S. Komuro, T. Katsumata, T. Morikawa, X. Zhao, H. Isshiki, and Y. Aoyagi J. Appl. Phys. 88 2000 7129
- (2000) J. Appl. Phys. , vol.88 , pp. 7129
- Komuro, S.¹ Katsumata, T.² Morikawa, T.³ Zhao, X.⁴ Isshiki, H.⁵ Aoyagi, Y.⁶

4
- 0035942412
- S. Kim, S.J. Rhee, J.O. White, A.M. Mitofsky, X. Li, G.C. Papen, J.J. Coleman, and S.G. Bishop Mater. Sci. Eng. B 81 2001 136
- (2001) Mater. Sci. Eng. B , vol.81 , pp. 136
- Kim, S.¹ Rhee, S.J.² White, J.O.³ Mitofsky, A.M.⁴ Li, X.⁵ Papen, G.C.⁶ Coleman, J.J.⁷ Bishop, S.G.⁸

5
- 0027640176
- K. Takahei, and A. Taguchi J. Appl. Phys. 74 1993 1979
- (1993) J. Appl. Phys. , vol.74 , pp. 1979
- Takahei, K.¹ Taguchi, A.²

6
- 0024668337
- P.N. Favennec, H. L'Haridon, M. Salvi, D. Moutonnet, and Y. Le Guillou Electron. Lett 25 1989 718
- (1989) Electron. Lett , vol.25 , pp. 718
- Favennec, P.N.¹ L'Haridon, H.² Salvi, M.³ Moutonnet, D.⁴ Le Guillou, Y.⁵

7
- 28044437176
- F. Xu, Z.M. Jiang, and Y.L. Fan Thin Solid Films 496 2006 500
- (2006) Thin Solid Films , vol.496 , pp. 500
- Xu, F.¹ Jiang, Z.M.² Fan, Y.L.³

8
- 33644971616
- Z. Zhou, T. Komori, T. Ayukawa, A. Koizumi, N. Matsunami, Y. Takeda, and M. Morinaga Opt. Mater. 28 2006 727
- (2006) Opt. Mater. , vol.28 , pp. 727
- Zhou, Z.¹ Komori, T.² Ayukawa, T.³ Koizumi, A.⁴ Matsunami, N.⁵ Takeda, Y.⁶ Morinaga, M.⁷

9
- 24644484942
- Z. Zhou, T. Komori, T. Ayukawa, M. Morinaga, A. Koizumi, and Y. Takeda Appl. Phys. Lett. 87 2005 091109
- (2005) Appl. Phys. Lett. , vol.87 , pp. 091109
- Zhou, Z.¹ Komori, T.² Ayukawa, T.³ Morinaga, M.⁴ Koizumi, A.⁵ Takeda, Y.⁶

10
- 0001413954
- S. Komuro, T. Katsumata, T. Morikawa, X. Zhao, H. Isshiki, and Y. Aoyagi Appl. Phys. Lett. 76 2000 3935
- (2000) Appl. Phys. Lett. , vol.76 , pp. 3935
- Komuro, S.¹ Katsumata, T.² Morikawa, T.³ Zhao, X.⁴ Isshiki, H.⁵ Aoyagi, Y.⁶

11
- 0037064978
- M. Kohls, M. Bonanni, L. Spanhel, D. Su, and Michael Giersig Appl. Phys. Lett. 81 2002 3858
- (2002) Appl. Phys. Lett. , vol.81 , pp. 3858
- Kohls, M.¹ Bonanni, M.² Spanhel, L.³ Su, D.⁴ Giersig, M.⁵

12
- 0034721688
- P. Andrew, and W.L. Barnes Science 290 2000 785
- (2000) Science , vol.290 , pp. 785
- Andrew, P.¹ Barnes, W.L.²

13
- 29744469163
- T. Nakamura, M. Fujii, K. Imakita, and S. Hayahashi Phys. Rev. B 72 2005 235412
- (2005) Phys. Rev. B , vol.72 , pp. 235412
- Nakamura, T.¹ Fujii, M.² Imakita, K.³ Hayahashi, S.⁴

14
- 67649427739
- H. Lou, X. Wang, Z. Tao, F. Lu, Z. Jiang, L. Mai, and F. Xu Appl. Surf. Sci. 255 2009 8217
- (2009) Appl. Surf. Sci. , vol.255 , pp. 8217
- Lou, H.¹ Wang, X.² Tao, Z.³ Lu, F.⁴ Jiang, Z.⁵ Mai, L.⁶ Xu, F.⁷

15
- 79952487089
- Max-Planck-Institut für Plasmaphysik Garching, Germany
- M. Mayer SIMNRA User's Guide 6.05 2009 Max-Planck-Institut für Plasmaphysik Garching, Germany
- (2009) SIMNRA User's Guide 6.05
- Mayer, M.¹

16
- 0004071199
- Powder Diffraction File ASTM, Newtown Square, PA 19073-3273 Card 895012, 891397
- Powder Diffraction File, Joint Committee on Powder Diffraction Standards, ASTM, Newtown Square, PA 19073-3273, (2002) Card 895012, 891397.
- (2002) Joint Committee on Powder Diffraction Standards

17
- 21644435365
- K.A. Alim, V.A. Fonoberov, M. Shamsa, and A.A. Balandina J. Appl. Phys. 97 2005 124313
- (2005) J. Appl. Phys. , vol.97 , pp. 124313
- Alim, K.A.¹ Fonoberov, V.A.² Shamsa, M.³ Balandina, A.A.⁴

18
- 44749093487
- L. Yang, Y. Tang, A. Hu, X. Chen, K. Liang, and L. Zhang Phys. B 403 2008 2230
- (2008) Phys. B , vol.403 , pp. 2230
- Yang, L.¹ Tang, Y.² Hu, A.³ Chen, X.⁴ Liang, K.⁵ Zhang, L.⁶

19
- 0006412205
- A. Polman J. Appl. Phys. 82 1997 1
- (1997) J. Appl. Phys. , vol.82 , pp. 1
- Polman, A.¹

20
- 77956226325
- L.L. Mai, F. Xu, Z.M. Jiang, Z.Q. Ma, X. Wang, R. Xu, Y.L. Fan, H. Lou, and F. Lu Thin Solid Films 518 2010 6993
- (2010) Thin Solid Films , vol.518 , pp. 6993
- Mai, L.L.¹ Xu, F.² Jiang, Z.M.³ Ma, Z.Q.⁴ Wang, X.⁵ Xu, R.⁶ Fan, Y.L.⁷ Lou, H.⁸ Lu, F.⁹

21
- 0001122405
- P.G. Kik, M.J.A. de Dood, K. Kikoin, and A. Polman Appl. Phys. Lett. 70 1997 1721
- (1997) Appl. Phys. Lett. , vol.70 , pp. 1721
- Kik, P.G.¹ De Dood, M.J.A.² Kikoin, K.³ Polman, A.⁴

22
- 43249103364
- L. Douglas, R. Mundle, R. Konda, C.E. Bonner, A.K. Pradhan, D.R. Sahu, and J.L. Huang Opt. Lett. 33 2008 815
- (2008) Opt. Lett. , vol.33 , pp. 815
- Douglas, L.¹ Mundle, R.² Konda, R.³ Bonner, C.E.⁴ Pradhan, A.K.⁵ Sahu, D.R.⁶ Huang, J.L.⁷

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