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Volumn 520, Issue 2, 2011, Pages 684-688

Plasma deposition of n-SiOx nanocrystalline thin film for enhancing the performance of silicon thin film solar cells

Author keywords

Amorphous silicon; Light trapping; n SiOx; Plasma enhanced chemical vapor deposition; Solar cells

Indexed keywords

A-SI:H; AMORPHOUS SILICON (A-SI:H); BACK REFLECTORS; BOTTOM CELLS; CURRENT MATCHING; DEPOSITION PARAMETERS; INTRINSIC LAYER THICKNESS; LIGHT TRAPPING; N-SIOX; NANOCRYSTALLINE THIN FILMS; SILICON THIN FILM; SINGLE LAYER; SOLAR CELL PERFORMANCE; SPECTRAL RESPONSE; TANDEM SOLAR CELLS; WAVELENGTH RANGES;

EID: 80755133538     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.06.068     Document Type: Conference Paper
Times cited : (13)

References (27)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.