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Volumn 512, Issue 1, 2012, Pages 140-143
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Preparation of ferroelectric BaTi2O5 thin films on Pt(1 1 1)/Ti/SiO2/Si substrates by pulsed laser deposition
a
a
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Author keywords
b Axis orientation; BaTi2O5 thin films; Ferroelectric property; Pt(1 1 1) Ti SiO2 Si substrates; Pulsed laser deposition
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Indexed keywords
AS-DEPOSITED FILMS;
B-AXIS ORIENTATION;
BATI2O5 THIN FILMS;
COERCIVE ELECTRIC FIELD;
CRYSTALLOGRAPHIC ORIENTATIONS;
DIFFERENT SUBSTRATES;
FERROELECTRIC PROPERTY;
HIGHER-DEGREE;
OXYGEN PARTIAL PRESSURE;
PT(1 1 1)/TI/SIO2/SI SUBSTRATES;
PT(111);
ROOM TEMPERATURE;
TEXTURE COEFFICIENT;
BARIUM COMPOUNDS;
ELECTRIC FIELDS;
ELECTRIC PROPERTIES;
FERROELECTRIC FILMS;
FERROELECTRICITY;
PLATINUM;
POLARIZATION;
PULSED LASER DEPOSITION;
PULSED LASERS;
SILICON;
SUBSTRATES;
THIN FILMS;
VAPOR DEPOSITION;
FILM PREPARATION;
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EID: 80555122839
PISSN: 09258388
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jallcom.2011.09.049 Document Type: Article |
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Times cited : (8)
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References (17)
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