New sputtering concept for optical precision coatings

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8168, Issue , 2011, Pages

  Rademacher, Daniel ^a   Bräuer, Günter ^a   Vergöhl, Michael ^a   Fritz, Benjamin ^a   Zickenrott, Tobias ^a  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

Author keywords

Cylindrical targets; Magnetron sputtering; New sputter concept; Optical coatings; Particles

Indexed keywords

COATING PLANTS; CYLINDRICAL TARGET; DEPOSITION PROCESS; LONG TERM STABILITY; MULTI-LAYER-COATING; NEW SPUTTER CONCEPT; OXYGEN PARTIAL PRESSURE; PARTICLE DENSITIES; PLANAR MAGNETRON; PRECISION COATINGS; PROCESS STABILITY; REACTIVE MAGNETRON SPUTTERING; REDEPOSITION; ROTATING DISC; SINGLE LAYER; TARGET MATERIALS;

CATHODES; DEPOSITION; FILM PREPARATION; GLASS PLANTS; MAGNETRON SPUTTERING; OPTICAL COATINGS; OPTICAL MULTILAYERS; OXIDE FILMS; THIN FILMS; VAPOR DEPOSITION;

OPTICAL PROPERTIES;

EID: 80455127056     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.896843     Document Type: Conference Paper

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