High quality factor graphene varactors for wireless sensing applications

Applied Physics Letters

Volumn 99, Issue 16, 2011, Pages

  Koester, Steven J ^a  

^a UNIVERSITY OF MINNESOTA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE CONCENTRATION; EQUIVALENT OXIDE THICKNESS; HIGH QUALITY FACTORS; QUALITY FACTORS; QUANTUM CAPACITANCE EFFECTS; RESONANT FREQUENCY TUNING; TEMPERATURE SENSITIVITY; TRANSPORT PARAMETERS; WIRELESS SENSING; WIRELESS SENSOR;

CAPACITANCE; ELECTRIC CHARGE; GATE DIELECTRICS; GATES (TRANSISTOR); METAL INSULATOR BOUNDARIES; NATURAL FREQUENCIES;

GRAPHENE;

EID: 80155140149     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3651334     Document Type: Article

References (12)

1. K. I. Bolotin, K. J. Sikes, Z. Jiang, G. Fudenberg, J. Hone, P. Kim, and H. L. Stormer, Solid State Commun. 146, 351 (2008). 10.1016/j.ssc.2008.02.024
2. A. A. Balandin, S. Ghosh, W. Bao, I. Calizo, D. Teweldebrhan, F. Miao, and C. N. Lau, Nano Lett. 8, 902 (2008). 10.1021/nl0731872
3. Z. Chen and J. Appenzeller, in International Electron Devices Meeting (IEDM), San Francisco, CA, 15-17 December 2008.
4. T. Fang, A. Konar, H. Xing, and D. Jena, Appl. Phys. Lett. 91, 092109 (2007). 10.1063/1.2776887
5. C. Son and B. Ziaie, IEEE Trans. Biomed. Eng. 55, 1772 (2008). 10.1109/TBME.2008.919141
6. P.-J. Chen, S. Saati, R. Varma, M. S. Humayun, and Y.-C. Tai, IEEE J. Microelectromech. Syst. 19, 721 (2010). 10.1109/JMEMS.2010.2049825
7. J.-B. Yau, M. S. Gordon, K. P. Rodbell, S. J. Koester, P. W. DeHaven, D.-G. Park, and W. E. Haensch, in 2011 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA), Hsinchu, Taiwan, 25-27 April 2011.
8. C. Shan, H. Yang, J. Song, D. Han, A. Ivaska, and L. Niu, Anal. Chem. 81, 2378 (2009). 10.1021/ac802193c
9. A. Venugopal, J. Chan, X. Li, C. W. Magnuson, W. P. Kirk, L. Colombo, R. S. Ruoff, and E. M. Vogel, J. Appl. Phys. 109, 104511 (2011). 10.1063/1.3592338
10. D. Dunwell and B. Frank, in IEEE Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems, Long Beach, CA, 10-12 January 2007.
11. L.-. Ragnarsson, T. Chiarella, M. Togo, T. Schram, P. Absil, and T. Hoffmann, J. Microelectronic Eng. 88, 1317 (2011). 10.1016/j.mee.2011.03.121
12. J. F. Kang, H. Y. Yu, C. Ren, M.-F. Li, D. S. H. Chan, X. Y. Liu, and D.-L. Kwong, Electrochem. Solid-State Lett. 8, G311 (2005). 10.1149/1.2052051