Plasma polymerization of amine-containing thin films and the studies on the deposition kinetics

Surface and Coatings Technology

Volumn 206, Issue 6, 2011, Pages 1299-1306

  Mangindaan, Dave ^a   Kuo, Wei Hsuan ^a   Chang, Ching Chuan ^a   Wang, Shu Ling ^a   Liu, Hsiu Chi ^a   Wang, Meng Jiy ^a  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

Allylamine; Amine functionality; Plasma polymerization; Propargylamine; Propylamine; Surface characterizations

Indexed keywords

ALLYL AMINE; AMINE FUNCTIONALITY; PROPARGYLAMINE; PROPYLAMINES; SURFACE CHARACTERIZATIONS;

CELL CULTURE; CHEMICAL BONDS; DEPOSITION; DEPOSITION RATES; FILM PREPARATION; FUNCTIONAL POLYMERS; KINETICS; MATHEMATICAL MODELS; ORGANIC COMPOUNDS; PLASMA DEPOSITION; PLASMAS; SURFACE CHEMISTRY; THIN FILMS; UNSATURATED POLYMERS; VAPOR DEPOSITION;

PLASMA POLYMERIZATION;

EID: 80055113746     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.08.046     Document Type: Article

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