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Volumn 22, Issue 5, 2010, Pages 1732-1738
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Conformal, amine-functionalized thin films by initiated chemical vapor deposition (iCVD) for hydrolytically stable microfluidic devices
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Author keywords
[No Author keywords available]
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Indexed keywords
4-AMINOSTYRENE;
AMINE FUNCTIONAL GROUPS;
AMINE GROUPS;
AMINE MOIETIES;
BONDING PROCESS;
CHEMICAL FUNCTIONALITY;
CYCLIC OLEFIN COPOLYMERS;
EPOXY GROUP;
FUNCTIONALIZATIONS;
FUNCTIONALIZED;
FUNCTIONALIZED SURFACES;
HIGH RESISTANCE;
HYDROLYTIC DEGRADATION;
LOW TEMPERATURES;
MICRO-FLUIDIC DEVICES;
MICROFLUIDIC STRUCTURES;
NON-PLANAR STRUCTURES;
ORDER OF MAGNITUDE;
POLY(GLYCIDYL METHACRYLATE);
POLYDIMETHYLSILOXANE PDMS;
QUANTUM DOT;
SCANNING ELECTRON MICROSCOPES;
SI WAFER;
TERT-BUTYL PEROXIDE;
ACRYLIC MONOMERS;
ATOM TRANSFER RADICAL POLYMERIZATION;
CHEMICAL VAPOR DEPOSITION;
DEPOSITION;
FLUIDIC DEVICES;
FLUORESCENCE MICROSCOPY;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
FUNCTIONAL GROUPS;
INITIATORS (CHEMICAL);
MICROFLUIDICS;
OLEFINS;
PHOTODEGRADATION;
PLASMA DEPOSITION;
POLYACRYLATES;
POLYETHYLENE TEREPHTHALATES;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTING SILICON COMPOUNDS;
SEMICONDUCTOR QUANTUM DOTS;
SILICON WAFERS;
SILICONES;
SYNTHESIS (CHEMICAL);
THERMOPLASTICS;
THIN FILMS;
X RAY PHOTOELECTRON SPECTROSCOPY;
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EID: 77949350048
PISSN: 08974756
EISSN: 15205002
Source Type: Journal
DOI: 10.1021/cm903156a Document Type: Article |
Times cited : (90)
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References (29)
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