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Surface and Coatings Technology

Volumn 206, Issue 5, 2011, Pages 1020-1023

Sputter deposition and computational study of M-TiO2 (M=Nb, Ta) transparent conducting oxide films

(5) Chen, De ming a,b,c Xu, Gang a Miao, Lei a Nakao, Setsuo c Jin, Ping c,d

a GUANGZHOU INSTITUTE OF ENERGY CONVERSION (China)

b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES (China)

c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

d SHANGHAI INSTITUTE OF CERAMICS (China)

Author keywords

Co sputtering; Nb doped; Ta doped; Theoretical calculations; Titanium dioxide; Transparent conducting oxide

Indexed keywords

COSPUTTERING; NB-DOPED; TA-DOPED; THEORETICAL CALCULATIONS; TRANSPARENT CONDUCTING OXIDE;

ABSORPTION SPECTROSCOPY; AMORPHOUS FILMS; CONDUCTIVE FILMS; CRYSTAL GROWTH; DOPING (ADDITIVES); ELECTRON MOBILITY; ISOMERS; OXIDES; REFRACTIVE INDEX; TITANIUM; TITANIUM DIOXIDE;

OXIDE FILMS;

EID: 80055111354 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2011.04.007 Document Type: Article

Times cited : (16)

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