A wireless and passive wafer cleanliness monitoring unit via electromagnetic coupling for semicondutcor/MEMS manufacturing facilities

Sensors and Actuators, A: Physical

Volumn 171, Issue 2, 2011, Pages 414-420

  Zhang, Xu ^a   Chae, Junseok ^a  

^a Arizona State University   (United States)

Author keywords

Electromagnetic coupling; Passive sensing; Underwater sensing; Wafer cleanliness monitoring

Indexed keywords

CHEMICAL SENSING SYSTEMS; CONDUCTIVITY DATA; CONTROL SOLUTIONS; COUPLED POWER; ELECTROMAGNETIC (EM) COUPLING; FORM FACTORS; GLASS WAFER; IN-SITU; IN-SITU CHARACTERIZATION; INTER-DIGITATED ELECTRODES; MANUFACTURING FACILITY; MEMS CHEMICAL SENSORS; MICROFEATURES; ON-WAFER; PASSIVE SENSING; REAL TIME; RINSING PROCESS; RINSING WATER; SODIUM HYDROXIDES; UNDERWATER SENSING; WAFER CLEANLINESS MONITORING; WIRELESS SYSTEMS; WORKING DISTANCES;

APPROXIMATION THEORY; CHEMICAL SENSORS; ELECTROMAGNETIC COUPLING; ELECTROMAGNETISM; HYDROCHLORIC ACID; MANUFACTURE; SODIUM; SULFURIC ACID; TRANSPONDERS;

MONITORING;

EID: 80055061438     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2011.08.005     Document Type: Article

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