![]() |
Volumn 5, Issue 6, 2005, Pages 1185-1196
|
Micromachined silicon electrolytic conductivity probes with integrated temperature sensor
d
UIUC
(United States)
|
Author keywords
Deep reactive ion etching (DRIE); Double layer; Electrode impedance; Electrolytic conductivity; Four electrode measurement; Micromachining; Platinum black; Resistive temperature device (RTD)
|
Indexed keywords
DOUBLE LAYER;
ELECTRODE IMPEDANCE;
FOUR-ELECTRODE MEASUREMENT;
ELECTRIC CONDUCTIVITY;
ELECTRIC IMPEDANCE;
MICROELECTRODES;
MICROMACHINING;
PROBES;
REACTIVE ION ETCHING;
SILICON;
MICROSENSORS;
|
EID: 29044442771
PISSN: 1530437X
EISSN: None
Source Type: Journal
DOI: 10.1109/JSEN.2005.855596 Document Type: Article |
Times cited : (25)
|
References (10)
|