In situ and real-time metrology during rinsing of micro- and nano-structures

Microelectronic Engineering

Volumn 86, Issue 2, 2009, Pages 199-205

  Yan, Jun ^a   Dhane, Kedar ^a   Vermeire, Bert ^b   Shadman, Farhang ^a  

^a University of Arizona   (United States)

^b Arizona State University   (United States)

Author keywords

Cleaning; Metrology; Rinse model; Sensor; Wafer rinsing; Water usage

Indexed keywords

IMPURITIES; MEASUREMENTS; SENSORS; TIME MEASUREMENT;

BULK WATERS; CASE STUDIES; CHARGE EFFECTS; CHEMICAL RESIDUES; FINE STRUCTURES; IN-SITU; KEY COMPONENTS; METROLOGY; METROLOGY METHODS; NEW TECHNOLOGIES; PATTERNED WAFERS; PROCESS MODELS; RESIDUAL IMPURITIES; RINSE MODEL; SENSOR HARDWARES; SULFATE IONS; SURFACE INTERACTIONS; TESTING RESULTS; TRANSPORT PROCESSES; WAFER RINSING; WAFER SURFACES; WATER USAGE;

WATER TREATMENT;

EID: 58149240078     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.10.014     Document Type: Article

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