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Volumn 11, Issue 11, 2011, Pages 3031-3035

Effect of oxygen plasma treatment on characteristics of TiO2 photodetectors

Author keywords

Metal semiconductor metal (MSM); photodetectors (PDs); rf sputter; titanium dioxide (TiO2 )

Indexed keywords

APPLIED BIAS; CORNING GLASS; EFFECT OF OXYGEN; FIELD EMISSION SCANNING ELECTRON MICROSCOPES; FOUR-POINT PROBE MEASUREMENTS; METAL SEMICONDUCTOR METAL; PLASMA CONDITIONS; PLASMA TREATMENT; RADIO FREQUENCY MAGNETRON SPUTTERING; RF SPUTTER; TIO; ULTRA-VIOLET;

EID: 80055031313     PISSN: 1530437X     EISSN: None     Source Type: Journal    
DOI: 10.1109/JSEN.2011.2150212     Document Type: Article
Times cited : (19)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.