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Volumn 15, Issue 1, 2004, Pages 37-41

The effect of He or Ar/O2 plasma treatment on Si surface prior to chemical vapor deposition of SiO2

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CONDENSATION; GLOW DISCHARGES; HELIUM; INTERFACES (MATERIALS); LIGHT EMISSION; OXIDATION; PLASMA APPLICATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0347762692     PISSN: 09574522     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1026240904706     Document Type: Article
Times cited : (8)

References (35)
  • 16
    • 0003400640 scopus 로고
    • John Wiley & Sons, New York
    • B. CHAPMAN, in "Glow Discharge Process" (John Wiley & Sons, New York, 1980) p. 44.
    • (1980) Glow Discharge Process , pp. 44
    • Chapman, B.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.