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Volumn 12, Issue 1, 2012, Pages 303-306

Effects of interface between SnO2 thin film and Si substrate on growth time

Author keywords

Interface; LPCVD; SiO2; SnO2; Thin films

Indexed keywords

ATOMIC RATIO; DEPOSITION TIME; GROWTH TIME; HIGH-RESOLUTION TRANSMISSION ELECTRON MICROSCOPES; LPCVD; SI SUBSTRATES; SIO2; SNO2;

EID: 80054818764     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2011.06.025     Document Type: Article
Times cited : (10)

References (14)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.