3D epitaxial growth through holes for the fabrication of thin-film solar cells

Journal of Crystal Growth

Volumn 335, Issue 1, 2011, Pages 37-41

  Brinkmann, Nils ^b   Pócza, David ^a   Mitchell, Emily J ^c   Reber, Stefan ^a  

^a FRAUNHOFER INSTITUTE FOR SOLAR ENERGY SYSTEMS ISE   (Germany)

^b UNIVERSITY OF KONSTANZ   (Germany)

^c UNIVERSITY OF NEW SOUTH WALES   (Australia)

Author keywords

A1. Computer simulation; A1. Fluid flows; A1. Mass transfer; A3. Chemical vapour deposition process; B2. Semiconducting silicon; B3. Solar cells

Indexed keywords

A1. COMPUTER SIMULATION; A1. FLUID FLOWS; A1. MASS TRANSFER; A3. CHEMICAL VAPOUR DEPOSITION PROCESS; B2. SEMICONDUCTING SILICON; B3. SOLAR CELLS;

CHEMICAL VAPOR DEPOSITION; COMPUTATIONAL FLUID DYNAMICS; CRYSTALLOGRAPHY; FABRICATION; FILM GROWTH; FLOW OF FLUIDS; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR GROWTH; THREE DIMENSIONAL;

EPITAXIAL GROWTH;

EID: 80054733548     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2011.07.017     Document Type: Article

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