The RTCVD160 - A new lab-type silicon CVD processor for silicon deposition on large area substrates

Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion

Volumn B, Issue , 2003, Pages 1368-1371

  Reber, S ^a   Haase, C ^a   Schillinger, N ^a   Bau, S ^a   Hurrle, A ^a  

^a FRAUNHOFER INSTITUTE FOR SOLAR ENERGY SYSTEMS ISE   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

FAST TEMPERATURE RAMPS; SILICON DEPOSITION; SILICON EPITAXY; THIN-FILM SOLAR CELLS;

CHEMICAL VAPOR DEPOSITION; DECOMPOSITION; ELECTRIC RESISTANCE; EPITAXIAL GROWTH; LASER BEAMS; SEMICONDUCTOR MATERIALS; SOLAR CELLS; THIN FILMS;

SILICON;

EID: 6344256992     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)

1. rd World Conference and Exhibition on Photovoltaic Solar Energy Conversion (2003).
2. nd World Conference and Exhibition on Photovoltaic Solar Energy Conversion (1998) 1278-1283.
3. M.L. Hitchman, K.F. Jensen, "Chemical Vapor Deposition - Principles and Applications", Academic Press, 1993.
4. K.F. Jensen in Handbook of Crystal Growth, Vol.3, Chapter 13.