Interfacial roughness and temperature effects on exchange bias properties in coupled ferromagnetic/antiferromagnetic bilayers

Journal of Magnetism and Magnetic Materials

Volumn 324, Issue 4, 2012, Pages 403-409

  Maitre, A ^a   Ledue, D ^a   Patte, R ^a  

^a UNIVERSITÉ DE ROUEN   (France)

Author keywords

Exchange bias; Heisenberg model; Magnetic multilayer; Monte Carlo simulation

Indexed keywords

AFM; BI-LAYER; EFFECTIVE COUPLING; EXCHANGE BIAS; EXCHANGE FIELDS; EXCHANGE-BIAS FIELDS; FLAT INTERFACE; HEISENBERG MODELS; HEISENBERG SPINS; INTERFACE ROUGHNESS; INTERFACIAL ROUGHNESS; MAGNETIC CONFIGURATION; MAGNETIC FRUSTRATIONS; MONTE CARLO SIMULATION; NON-MONOTONIC DEPENDENCE; TEMPERATURE DEPENDENCE; TEMPERATURE INCREASE;

COMPUTER SIMULATION; MAGNETIC MULTILAYERS;

MONTE CARLO METHODS;

EID: 80054060398     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2011.07.049     Document Type: Article

References (30)

1. J. Nogués, and I.K. Schuller Journal of Magnetism and Magnetic Material 192 1999 203 232
2. T.J. Moran, J.M. Gallego, and I.K. Schuller Journal of Applied Physics 78 1995 1887
3. D. Han, J. Zhu, and J.H. Judy Journal of Applied Physics 81 1997 4996
4. D. Han, J. Zhu, J.H. Judy, and J.M. Sivertsen Journal of Applied Physics 81 1997 340
5. J. Nogués, D. Lederman, T.J. Moran, I.K. Schuller, and K.V. Rao Applied Physics Letters 68 1996 3186
6. D. Lederman, J. Nogués, and I.K. Schuller Physical Review B 56 1997 2332
7. J.X. Shen, and M.T. Kief Journal of Applied Physics 79 1996 5008
8. C.-M. Park, K.-I. Min, and K.H. Shin Journal of Applied Physics 79 1996 6228
9. S. Soeya, M. Fuyama, S. Tadokoro, and T. Imagawa Journal of Applied Physics 79 1996 1604
10. W.F. Egelhoff Jr., P.J. Chen, C.J. Powell, M.D. Stiles, and R.D. McMichael Journal of Applied Physics 79 1996 2491
11. C. Leighton, J. Nogués, H. Scuhl, and I.K. Schuller Physical Review B 60 1999 12837
12. S.F. Cheng, J.P. Teter, P. Lubitz, M.M. Miller, L. Hoines, J.J. Krebs, D.M. Schaefer, and G.A. Prinz Journal of Applied Physics 79 1996 6234
13. W.H. Meiklejohn, and C.P. Bean Physical Review 102 1956 1413
14. A.P. Malozemoff Physical Review B 35 1987 3679
15. N.C. Koon Physical Review Letters 78 1997 4865
16. L. Néel Annals of Physics 2 1967 61
17. D. Mauri, H.C. Siegmann, P.S. Bagus, and E. Kay Journal of Applied Physics 62 1987 3047
18. K. Takano, R.H. Kodama, A.E. Berkowitz, W. Cao, and G. Thomas Physical Review Letters 79 1997 1130
19. T.P.A. Hase, B.D. Fulthorpe, S.B. Wilkins, B.K. Tanner, C.H. Marrows, and B.J. Hickey Applied Physics Letters 79 2001 985
20. S. Brück, G. Schütz, E. Goering, X. Ji, and K.M. Krishnan Physical Review Letters 101 2008 126402
21. U. Nowak, K.D. Usadel, J. Keller, P. Miltényi, B. Beschoten, and G. Güntherodt Physical Review B 66 2002 014430
22. J. Spray, and U. Nowak Journal of Physics D: Applied Physics 39 2006 4536
23. T.C. Schulthess, and W.H. Butler Journal of Applied Physics 85 1999 5510
24. J. Camarero, Y. Pennec, J. Vogel, M. Bonfim, S. Pizzini, F. Ernult, F. Fettar, F. Garcia, F. Lançon, L. Billard, B. Dieny, A. Tagliaferri, and N.B. Brookes Physical Review Letters 91 2003 027201
25. J.R.L. de Almeida, and S.M. Rezende Physical Review B 65 2002 092412
26. U. Nowak, R.W. Chantrell, and E.C. Kennedy Physical Review Letters 84 2000 163
27. N. Metropolis, A. Rosenbluth, M. Rosenbluth, A. Teller, and E. Teller Journal of Chemical Physics 21 1953 1087
28. E. Talbot, D. Ledue, and P.E. Berche Journal of Applied Physics 106 2009 023901
29. K. Chen, A.M. Ferrenberg, and D.P. Landau Physical Review B 48 1993 3249
30. M. Ali, C.H. Marrows, M. Al-Jawad, B.J. Hickey, A. Misra, U. Nowak, and K.D. Usadel Physical Review B 68 2003 214420