Diffractive light trapping in crystal-silicon films: Experiment and electromagnetic modeling

Applied Optics

Volumn 50, Issue 29, 2011, Pages 5728-5734

  Weiss, Dirk N ^a   Lee, Benjamin G ^b   Richmond, Dustin A ^a   Nemeth, William ^b   Wang, Qi ^b   Keszler, Douglas A ^c   Branz, Howard M ^b  

^a University of Washington   (United States)

^b NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

^c OREGON STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL ELECTROMAGNETICS; ELECTROMAGNETIC WAVE ABSORPTION; LIGHT ABSORPTION; NANOIMPRINT LITHOGRAPHY;

CRYSTAL SILICON; ELECTROMAGNETIC MODELING; FITTING PARAMETERS; INCIDENCE ANGLES; NANO-IMPRINTING; PRECURSOR FILMS; REFLECTION MEASUREMENTS; RIGOROUS COUPLED WAVE ANALYSIS;

METALLIC FILMS;

EID: 80053931576     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.50.005728     Document Type: Article

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