Light management of a-Si:H solar cells using textured zinc oxide with adjustable haze values

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 8, Issue 10, 2011, Pages 2998-3001

  Zhang, Liping ^a   Yunaz, Ihsanul Afdi ^a   Kasashima, Shunsuke ^a   Wada, Hidetoshi ^a   Hongsingthong, Aswin ^a   Krajangsang, Taweewat ^a   Kurokawa, Yasuyoshi ^a   Konagai, Makoto ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

A Si:H solar cells; MOCVD; Surface roughness; Textured ZnO; Transparent conductive oxides

Indexed keywords

A-SI:H; ACTIVE LAYER; ANTI REFLECTIVE COATINGS; BORON-DOPED; CHEMICAL VAPOUR DEPOSITION; HYDROGENATED AMORPHOUS SILICON (A-SI:H); LIGHT MANAGEMENT; LIGHT-TRAPPING; METAL ORGANIC; RMS ROUGHNESS; ROOT MEAN SQUARE ROUGHNESS; SINGLE JUNCTION; TEXTURED ZINC OXIDE; THICKNESS OF FILMS; TRANSPARENT CONDUCTIVE OXIDES; ZNO; ZNO FILMS;

AMORPHOUS FILMS; BORON; CONDUCTIVE FILMS; CONVERSION EFFICIENCY; METALLIC FILMS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; ORGANIC CHEMICALS; ORGANOMETALLICS; OXIDE FILMS; SEMICONDUCTING SILICON COMPOUNDS; SHEET RESISTANCE; SILICON; SURFACE ROUGHNESS; ZINC; ZINC OXIDE;

AMORPHOUS SILICON;

EID: 80053584011     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.201001180     Document Type: Article

References (21)

1. W. Wenas A. Yamada, M. Konagai, and K. Takahashi, J. Appl. Phys. 70, 7119 (1991).
2. S. Nakano and Y. Kuwano, Appl. Phys. A 41, 267 (1986).
3. B. Sang, K. Dairiki, A. Yamada, and M. Konagai, Jpn. J. Appl. Phys. 38, 4983 (1999).
4. J. Meier, J. Spitznagel, U. Kroll, C. Bucher, S. Fay, T. Moriarty, and A. Shah, in: Proceedings 3rd World conference on Photovoltaic Energy Conversion, Osaka, Japan, 2003 (WCPEC-3 organizing committee, Tokyo, 2004), p. 1544.
5. J. Koh, Y. Lee, H. Fujiwara, C. R. Wronski, and R. W. Collins, Appl. Phys. Lett. 73, 1526 (1998).
6. J. Krč, M. Zeman, F. Smole, J. W. Metselaar, and M. Topič, Sol. Energy Mater. Sol. Cells 74, 401 (2002).
7. K. Itoh, H. Matsumoto, T. Kobata, and A. Fujishima, Appl. Phys. Lett. 51, 1685 (1987).
8. T. Ikeda, K. Sato, Y. Hayashi, Y. Wakayama, K. Adachi, and H Nishimura, Sol. Energy Mater. Sol. Cells 34, 379 (1994).
9. S. Major, S. Kumar, M. Bhatnagar, and K. L. Chopra, Appl. Phys. Lett. 49, 394 (1986).
10. T. Minami, K. Oohashi, and S. Takata, Thin Solid Films 193/194, 721 (1990).
11. J. Meier, J. Spitznagel, U. Kroll, C. Bucher, S. Faÿ, T. Moriarty, and A. Shah, Thin Solid Films 451/452, 518 (2004).
12. O. Kluth, G. Schope, J. Hupkes, C. Agashe, J. Muller, and B. Rech, Thin Solid Films 442, 80 (2003).
13. X. Yu, J. Ma, F. Ji, Y. Wang, X. Zhang, C. Cheng, and H. Ma, Appl. Surf. Sci. 239, 222 (2005).
14. M. Kubon, E. Boehmer, F. Siebke, B. Rech, C. Beneking, and H. Wagner, Sol. Energy Mater. Sol. Cells 41/42, 485 (1996).
15. Jeong Chul Lee, Viresh Dutta, Jinsu Yoo, Junsin Yi, Jinsoo Song, and Kyung Hoon Yoon, Superlattices Microstruct. 42, 369 (2007).
16. J. Müller, B. Rech, J. Springer, and M. Vanecek, Sol. Energy 77, 917 (2004).
17. H. B. Li, R. H. Franken, J. K. Rath, and R. E. I. Schropp, Sol. Energy Mater. Sol. Cells 93, 338 (2009).
18. M. Zeman, J. A. Willemen, L. L. A. Vosteen, G. Tao, and J. W. Metselaar, Sol. Energy Mater. Sol. Cells 46, 81 (1997).
19. M. Zeman, R. A. C. M. M. Van Swaaij, M. Zuiddam, J. W. Metselaar, and R. E. I. Schropp, Sol. Energy Mater. Sol. Cells 66, 353 (2001).
20. J. Krč, M. Zeman, F. Smole, and M. Topič, Thin Solid Films 451-452, 298 (2004).
21. Seung Jae Baik, Jae Hoon Jang, Chang Hyun Lee, Woo Yeong Cho, and Koeng Su Lim, Appl. Phys. Lett. 70, 3516 (1997).